发明名称 EXPOSURE METHOD AND EXPOSURE SYSTEM
摘要 PROBLEM TO BE SOLVED: To add another shape to a rugged shape already formed on a glass original disk by a resist film. SOLUTION: In exposure processing of the original disk coated with the resist, a thin-film containing fluorescent dyestuffs having prescribed wavelength characteristics is formed on the original disk and is subjected to exposure. The fluorescent dyestuffs having such characteristics that the fluorescent dyestuffs condense a laser beam onto the original disk coated with the resist, are excited by the wavelength of this laser beam to emit fluorescence and do not expose the resist at the wavelength of the generated fluorescence or such characteristics that the fluorescent dyestuffs condense the laser beam of the wavelength to prevent the resist from being exposed by this wavelength onto the original disk coated with the resist, do not generate the fluorescence by one photon excitation or do not expose the resist at the wavelength of the fluorescence in spite of the generation of such fluorescence, and expose the resist at the wavelength of the fluorescence generated by two photon excitation are used as the fluorescent dyestuffs. The fluorescence generated by such fluorescent elements is imaged and detected and is used for focus control, etc. COPYRIGHT: (C)2003,JPO
申请公布号 JP2003233200(A) 申请公布日期 2003.08.22
申请号 JP20020031780 申请日期 2002.02.08
申请人 SONY CORP 发明人 IMANISHI SHINGO
分类号 G03F7/20;G03F7/207;G11B7/09;G11B7/26;H01L21/027;(IPC1-7):G03F7/20 主分类号 G03F7/20
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