MULTI-EXPOSURE METHOD WITH IMPROVED OVERLAY ACCURACY AND RECORD MEDIUM FOR RECORDING THE SAME

摘要

PURPOSE: A multi-exposure method and a record medium for recording the same are provided to be capable of improving the accuracy of overlay by using more than two sub-layouts. CONSTITUTION: Overlay parameters are calculated corresponding to each sub-layout for a multi-exposure. Then, the overlay parameters are inputted to an exposure equipment(400). After obtaining the last alignment parameters by correcting the inputted overlay parameters using the second parameters, which are obtained by carrying out a self-alignment according to each sub-layout, a compulsory correction is carried out(410,420). After exposing all the sub-layouts, a development process is carried out at exposed photoresist(430,440).