发明名称 HIGHER ORDER SILANE COMPOSITION AND PROCESS FOR FORMING SILICON FILM USING THE SAME
摘要 PROBLEM TO BE SOLVED: To obtain a higher order silane composition which contains a higher order silane compound having a larger molecular weight from the viewpoint of wettability, boiling point and safety upon its application onto a substrate, and especially can easily form a high-quality silicon film, and a process for forming the excellent silicon film using the composition. SOLUTION: The higher order silane composition contains the higher order silane compound obtained by photopolymerizing a solution of a photopolymerizable silane compound or a photopolymerizable silane compound in a liquid state by exposing it to ultraviolet irradiation. In the process for forming the silicon film, the higher order silane composition is applied onto a substrate. COPYRIGHT: (C)2004,JPO
申请公布号 JP2003313299(A) 申请公布日期 2003.11.06
申请号 JP20020119961 申请日期 2002.04.22
申请人 SEIKO EPSON CORP;JSR CORP 发明人 AOKI TAKASHI;FURUSAWA MASAHIRO;MATSUKI YASUO;IWAZAWA HARUO;TAKEUCHI YASUMASA
分类号 C01B33/029;C01B33/04;C08G77/60;C09D183/16;H01L21/208;H01L21/368;(IPC1-7):C08G77/60 主分类号 C01B33/029
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