发明名称 Solutions for cleaning polished aluminum-containing layers
摘要 Methods and solutions for cleaning a polished aluminum-containing layer, and the structures formed by these methods. The method for cleaning the polished aluminum-containing layer is practiced by contacting a polished aluminum-containing layer with a solution comprising water and a corrosion-inhibiting agent. In these methods and solutions, the water may be deionized water, the corrosion-inhibiting agent may be citric acid or one of its salts, and the solution may contain additional additives, such as chelating agents, buffers, oxidants, antioxidants, and surfactants. These methods and solutions reduce the corrosion caused by DI water used in cleaning polished aluminum-containing layers and maintain a passivative environment which protects the exposed aluminum structures.
申请公布号 US2003224958(A1) 申请公布日期 2003.12.04
申请号 US20020157480 申请日期 2002.05.29
申请人 ANDREAS MICHAEL T. 发明人 ANDREAS MICHAEL T.
分类号 C11D7/26;C11D11/00;C23G1/26;H01L21/02;H01L21/321;H01L21/3213;(IPC1-7):C11D1/00;C23G1/00 主分类号 C11D7/26
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