Photosensitive polymers and resist compositions containing the same

摘要

A class of photosensitive polymers having special utility in a resist composition is disclosed, said polymers being prepared utilizing a vinyl oxy alkyl adamantane carboxylate monomer having a structural formula as shown below, the polymers having a weight average molecular weight in the range of about 3,000 to 50,000: wherein x is an integer in the range of 2 to 6 inclusive. The photosensitive polymers of this invention include polymers having three or more monomer units and having the vinyl oxy alkyl adamantane carboxylate monomer polymerized with maleic acid anhydride and at least one monomer selected from the group consisting of a (meth)acrylate and norbornene derivative monomer.