| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a material suitable for manufacturing a system LCD, having excellent linearity and capable of forming a fine resist pattern. <P>SOLUTION: A positive type photoresist composition for manufacturing a substrate on which an integrated circuit and a liquid crystal display part are formed together is characterized in that it is constituted by containing an alkali soluble resin (A), a naphthoquinonediazido ester (B), a phenolic hydroxyl group containing compound (C) having a specific structure and an organic solvent (D). A method for forming the resist pattern is characterized in that it includes a step for forming a resist coating film on the substrate by using the positive type resist composition and a step for performing selective exposure using a mask on which both of a mask pattern for forming the resist pattern for the integral circuit and a mask pattern for forming the resist pattern for the liquid crystal display part are drawn to simultaneously form the resist pattern for the integral circuit and the resist pattern for the liquid crystal display part. <P>COPYRIGHT: (C)2004,JPO |
