发明名称 PROCESS FOR FABRICATING MICROSTRUCTURE, PROCESS FOR MANUFACTURING LIQUID EJECTION HEAD, AND LIQUID EJECTION HEAD
摘要 <P>PROBLEM TO BE SOLVED: To provide a costless, highly reliable and precise liquid ejection head and its manufacturing process. <P>SOLUTION: A thermally crosslinked positive photosensitive material layer (first positive photosensitive material layer) and a second positive photosensitive material layer are formed on a substrate and then the second positive photosensitive material layer is patterned followed by patterning of the first positive photosensitive material layer. Subsequently, a negative resin for forming a channel wall is applied thereon and an ejection hole is made in the negative resin layer before the positive photosensitive material layer is removed. The first positive photosensitive material is an ionizing radiation decomposing positive resist of a methacryl-based copolymer composition containing methacrylic acid having methacrylic acid unit of 2-30 wt% and molecular weight of 5,000-50,000, and the second positive photosensitive material is an ionizing radiation decomposing positive resist principally comprising polymethylisopropenylketone. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004042389(A) 申请公布日期 2004.02.12
申请号 JP20020201805 申请日期 2002.07.10
申请人 CANON INC 发明人 KUBOTA MASAHIKO;HIYAMA WATARU
分类号 B41J2/05;B41J2/14;B41J2/16;B81C1/00;G03F7/004;G03F7/26 主分类号 B41J2/05
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