METHOD OF SPRAYING REFERENCE SAMPLE FOR INSPECTING DEFECT OF WAFER

摘要

PURPOSE: A method of spraying a reference sample for inspecting a defect of a wafer is provided to inspect particles causing the defect of circuit patterns formed on the wafer by spraying the reference sample on the wafer. CONSTITUTION: Various sizes of reference sample are inputted into a storage tank(ST1). The dilute solution is inputted into the storage tank and the various sizes of reference sample are diluted by the dilute solution(ST2). The diluted reference sample is sprayed on a wafer(ST3). In the spraying process, the diluted reference sample is sprayed on the wafer after the wafer is rotated. The reference sample is formed with particles of latex. The dilute solution is formed with deionized water.