发明名称 |
NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION AND SEMICONDUCTOR DEVICE |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a negative photosensitive resin composition having high sensitivity and high resolution and exhibiting less film loss in a developed exposure section. <P>SOLUTION: The negative photosensitive resin composition contains: (A) a polyamide resin containing a structure shown in general formula (1); (B) a compound generating an acid by light; and (C) a compound having at least two or more 3,4-dihydro-2H-pyran groups in a molecule. <P>COPYRIGHT: (C)2004,JPO |
申请公布号 |
JP2004054196(A) |
申请公布日期 |
2004.02.19 |
申请号 |
JP20020244835 |
申请日期 |
2002.08.26 |
申请人 |
SUMITOMO BAKELITE CO LTD |
发明人 |
MAKABE HIROAKI;BANBA TOSHIO;HIRANO TAKASHI |
分类号 |
G03F7/037;C08G69/42;G03F7/004;H01L21/027;H01L21/312 |
主分类号 |
G03F7/037 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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