发明名称 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION AND SEMICONDUCTOR DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a negative photosensitive resin composition having high sensitivity and high resolution and exhibiting less film loss in a developed exposure section. <P>SOLUTION: The negative photosensitive resin composition contains: (A) a polyamide resin containing a structure shown in general formula (1); (B) a compound generating an acid by light; and (C) a compound having at least two or more 3,4-dihydro-2H-pyran groups in a molecule. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004054196(A) 申请公布日期 2004.02.19
申请号 JP20020244835 申请日期 2002.08.26
申请人 SUMITOMO BAKELITE CO LTD 发明人 MAKABE HIROAKI;BANBA TOSHIO;HIRANO TAKASHI
分类号 G03F7/037;C08G69/42;G03F7/004;H01L21/027;H01L21/312 主分类号 G03F7/037
代理机构 代理人
主权项
地址