| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a chemically amplified positive resist composition by which high-resolution positive resist patterns having excellent environmental resistance, good sensitivity to energy rays, and shapes of good order can be formed. <P>SOLUTION: The chemically amplified positive type resist composition includes an acid generating agent (A) composed of an onium cation and the borate anion of general formula (1): [BY<SB>m</SB>Z<SB>n</SB>]<SP>-</SP>, at least one acid forming agent (B) selected from sulfone compounds or sulfonate compounds, and high molecular macromolecules (C) having acid-labile groups. <P>COPYRIGHT: (C)2004,JPO |
