发明名称 |
PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive composition and a photosensitive lithographic printing plate having high sensitivity and excellent plate wear and linearity. <P>SOLUTION: The photosensitive composition contains: an addition polymerizable ethylenic double bond-containing monomer; a photopolymerization initiator composition; and a polymer binder. The photopolymerization initiator composition contains a polyhalogen compound having a specified structure. <P>COPYRIGHT: (C)2004,JPO |
申请公布号 |
JP2004170762(A) |
申请公布日期 |
2004.06.17 |
申请号 |
JP20020337845 |
申请日期 |
2002.11.21 |
申请人 |
KONICA MINOLTA HOLDINGS INC |
发明人 |
HIRABAYASHI KAZUHIKO |
分类号 |
G03F7/029;C08F2/50;G03F7/00;G03F7/027 |
主分类号 |
G03F7/029 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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