发明名称 PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive composition and a photosensitive lithographic printing plate having high sensitivity and excellent plate wear and linearity. <P>SOLUTION: The photosensitive composition contains: an addition polymerizable ethylenic double bond-containing monomer; a photopolymerization initiator composition; and a polymer binder. The photopolymerization initiator composition contains a polyhalogen compound having a specified structure. <P>COPYRIGHT: (C)2004,JPO
申请公布号 JP2004170762(A) 申请公布日期 2004.06.17
申请号 JP20020337845 申请日期 2002.11.21
申请人 KONICA MINOLTA HOLDINGS INC 发明人 HIRABAYASHI KAZUHIKO
分类号 G03F7/029;C08F2/50;G03F7/00;G03F7/027 主分类号 G03F7/029
代理机构 代理人
主权项
地址