APPARATUS AND METHOD FOR CONTROLLING TEMPERATURE OF CHEMICALS FOR WET ETCHING EQUIPMENT

摘要

PURPOSE: A method for controlling the temperature of chemicals for wet etching equipment is provided to prevent the component of unpredicted chemicals from varying, by constructing a series of module environments as the kind of chemical for etching a wafer varies with a predetermined process condition wherein the temperature of the chemical can be elastically varied and set, and by making the chemical circulated and supplied to an inner bath efficiently maintain the most suitable temperature for itself. CONSTITUTION: A main control unit(Mu) generalizes and controls the operation of wet etching equipment(1). A temperature controller forms a series of signal connections. After the temperature of the inside of a chemical supply pipe(9a) inserted into reinforcing tubes(22) provided with a heater(22a) is sensed, the main control unit is informed of the sensed temperature. Whether a series of temperature variation requiring commands for varying the temperature variation requiring commands are output from the main control unit is determined. When the temperature variation requiring commands are output from the main control unit, the quantity of heat generation of the heater is controlled according to a value written in the temperature variation requiring commands.