| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive composition with improved sensitivity, printing resistance, reproducibility of small dots and suppressing property of development sludge, and to provide a photosensitive lithographic printing plate coated with the above photosensitive composition. <P>SOLUTION: The photosensitive composition contains monomers having an addition polymerizable ethylenic double bond, a photopolymerization initiator composition, a polymer binder and an organic solvent. At least one of the photopolymerization initiator composition is a bromine compound expressed by general formula (1): R<SP>1</SP>-CBr<SB>2</SB>-(C=O)-R<SP>2</SP>. A compound expressed by formula (3): R<SB>1</SB>-(OCH<SB>2</SB>CHCH<SB>3</SB>)<SB>n</SB>-OR<SB>2</SB>is included by 50 to 100% of the organic solvent. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
