| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an inexpensive etchant composition which etches a metallic reflective multilayer film containing a SiO<SB>2</SB>film simultaneously with one solution, controls a side etching quantity of each film, and further does not damage the resin layer of a light-diffusing layer. <P>SOLUTION: The etchant composition for etching a metallic reflective multilayer film comprising two or more layers containing a metallic reflective film and a SiO<SB>2</SB>film simultaneously with one solution, comprises phosphoric acid, nitric acid, acetic acid, hydrofluoric acid and water each blended. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
