| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma production device which produces plasma having spatially uniform density. <P>SOLUTION: A plurality of high-frequency antennas 16 are arranged on the side wall of a vacuum vessel 11 so that electrodes for the antennas are disposed in parallel with the plane of a substrate base 14. The aspect ratios of the high-frequency antennas (such as the high-frequency antennas 161) arranged near the centers of each side wall in these antennas 16 are made larger than those of other antennas (such as the high-frequency antennas 162). The aspect ratios are obtained by dividing lengths in the vertical direction of the inner walls of the antennas by lengths in the direction parallel with the inner walls. Induced electric fields generated in the vertical direction on the inner walls of the antennas by applying a high-frequency voltage to the antennas 16 accelerate plasma electrons in the direction, and increase a plasma density. Accordingly, the plasma density in the vicinity of the center of the substrate base 14, in which the plasma density is made lower than peripheries in conventional devices, is increased, and the uniformity of the plasma density is improved. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
