| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive film having a four-layer structure and excellent workability with which a fine electrode pattern with high accuracy can be formed. <P>SOLUTION: The photosensitive film comprises a substrate film and layers of a photosensitive silver paste (1), a photosensitive black paste (2) and a release film in this order. The silver paste (1) contains 100 pts.wt. of an alkali-soluble resin (A), 40 to 150 pts.wt. of crosslinking monomers (B) having unsaturated double bonds, 15 to 60 parts by weight of a photopolymerization initiator (C), 400 to 1,500 pts.wt. of silver powder (D), 1 to 60 pts.wt. of glass frit and 50 to 250 pts.wt. of an organic solvent (F). The black paste (2) contains 100 pts.wt. of an alkali-soluble resin (A), 40 to 150 pts.wt. of crosslinking monomers (B) having unsaturated double bonds, 15 to 60 pts.wt. of a photopolymerization initiator (C), 100 to 500 pts.wt. of silver powder (D), 1 to 60 pts.wt. of glass frit (E), 50 to 250 parts by weight of an organic solvent (F) and 5 to 300 pts.wt. of a black inorganic pigment (G). <P>COPYRIGHT: (C)2004,JPO&NCIPI |
