发明名称 System for determining dry cleaning timing, method for determining dry cleaning timing, dry cleaning method, and method for manufacturing semiconductor device
摘要 A system for determining dry cleaning timing, includes: a manufacturing apparatus configured to process materials assigned by a sequence of lots; an apparatus controller configured to control the manufacturing apparatus and obtaining operational conditions of the manufacturing apparatus as apparatus information; a lot information input terminal configured to obtain process conditions of one of the lots as lot information; an apparatus information storage unit configured to store the apparatus information from the apparatus controller as an apparatus information database; a lot information storage unit configured to store the lot information from the lot information input terminal as a lot information database; and a cleaning determination unit configured to determine timing to perform a dry cleaning of the manufacturing apparatus based on the apparatus information database and the lot information database.
申请公布号 US6772045(B2) 申请公布日期 2004.08.03
申请号 US20020231019 申请日期 2002.08.30
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 KATSUI SHUJI;TANAKA MASAYUKI;KAMIMURA MASAKI;AKAHORI HIROSHI;MIZUSHIMA ICHIRO;NAKAO TAKASHI;YAMAMOTO AKIHITO;SAIDA SHIGEHIKO;TSUNASHIMA YOSHITAKA;MIKATA YUUICHI
分类号 C23C16/44;B08B11/00;G05B19/05;H01L21/02;H01L21/205;H01L21/302;H01L21/3065;H01L21/31;H04L12/66;(IPC1-7):G06F19/00 主分类号 C23C16/44
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