发明名称 Substrate transfer controlling apparatus and substrate transferring method
摘要 The present invention provides a substrate transfer controlling apparatus which can easily maximize the throughput of a substrate processing apparatus such as a semiconductor fabrication apparatus, and can satisfy a demand for immediacy of actions of a transfer device. The substrate transfer controlling apparatus comprises an input device (12) for inputting times required for actions of transfer devices (1a through 1c) and times required to process substrates in processing devices (3a through 9d), and a schedule calculator (21) for calculating execution times of actions of the transfer devices (1a through 1c) for allowing the time when a final one of the substrates to be processed is fully processed and returned from the substrate processing apparatus to be earliest, based on a predetermined conditional formula including, as parameters, the inputted times. The substrate transfer controlling apparatus further comprises an action commander (24) for instructing the corresponding transfer devices to perform the actions at the calculated execution times of the actions of the transfer devices (1a through 1c).
申请公布号 US6772029(B2) 申请公布日期 2004.08.03
申请号 US20020181293 申请日期 2002.07.16
申请人 EBARA CORPORATION 发明人 KOBAYASHI YOICHI;HIROO YASUMASA;OHASHI TSUYOSHI
分类号 G06Q50/00;G06Q50/04;H01L21/00;H01L21/66;(IPC1-7):G06F17/60;H01L21/68 主分类号 G06Q50/00
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