发明名称 TRANSPARENT BASE MATERIAL HAVING CURED FILM
摘要 <P>PROBLEM TO BE SOLVED: To provide a transparent base material having a cured film having a film, which has sufficient hardness and adhesion and is especially suitable as an antireflecting film, formed thereto. <P>SOLUTION: This transparent base material has the cured film formed on the surface thereof using a composition, which contains a compound having at least two epoxy group in its molecule and porous silica, as a curable material. Further, the transparent base material having a cured film suitably comprises a methyl methacrylate/styrene copolymer resin and the cured film is preferably the antireflecting film having a refractive index of 1.20-1.45 and a thickness of 0.01-1 &mu;m. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004284220(A) 申请公布日期 2004.10.14
申请号 JP20030080085 申请日期 2003.03.24
申请人 SUMITOMO CHEM CO LTD 发明人 OCHIAI SHINSUKE
分类号 G02B1/11;B05D5/06;B05D7/24;B32B7/02;B32B27/38;C09D163/00 主分类号 G02B1/11
代理机构 代理人
主权项
地址