发明名称 FILM COATING APPARATUS AND METHOD FOR FORMING UNIFORM FILM ON SUBSTRATE USING ANTI-DRYING PLATE
摘要 PURPOSE: A film coating apparatus and method are provided to form a uniform film on a substrate by controlling a dried state of a predetermined solution coated on the substrate using an anti-drying plate. CONSTITUTION: A film coating apparatus includes a substrate holding/supporting part, a nozzle, a driving part and an anti-drying plate. The nozzle(4) is used for discharging a coating solution to a substrate(W) of the substrate holding/supporting part. The driving part moves the substrate holding/supporting part to and fro, so that the nozzle seems to be relatively moved from front to rear. The anti-drying plate(6a,6b) is used for covering completely a coating solution discharged portion of the substrate. The anti-drying plate is spaced apart from the substrate as much as 2 mm or less.
申请公布号 KR20050000344(A) 申请公布日期 2005.01.03
申请号 KR20040046915 申请日期 2004.06.23
申请人 KABUSHIKI KAISHA TOSHIBA;SANYO ELECTRIC CO., LTD. 发明人 MIKATA, YUUICHI;MIZUNO, TSUYOSHI;SAITO, KIMIHIDE
分类号 B05D1/26;B05C5/00;B05C11/06;B05C11/10;G03F7/16;H01L21/00;H01L21/027;H01L21/31;(IPC1-7):H01L21/31 主分类号 B05D1/26
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