FILM PATTERN FORMING METHOD, DEVICE AND ITS MANUFACTURING METHOD, ELECTRO-OPTICAL DEVICE, AND ELECTRONIC APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a film pattern forming method by which a narrow film pattern can be formed precisely and stably.

SOLUTION: The method has a process of forming a bank B on a substrate P and a process of shooting liquid drops of functional liquid L on the substrate P and locating the functional liquid L to a region A divided by the bank B. An impact interval h of the liquid drops shot is an interval in which the liquid drops are connected in the region A after the impact. At the impact position of the liquid drops in the edge of the region A, a distance Le from the edge of the region A is not longer than one half of the impact interval h of the liquid drops.

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