发明名称 Abatement system targeting a by-pass effluent stream of a semiconductor process tool
摘要 An apparatus and method for abating toxic and/or hazardous gas species in a diluent gas stream line deriving from a by-pass line of a semiconductor process tool, comprising contacting the diluent gas stream with a dry resin sorbent material having an affinity for the toxic and/or hazardous gas species to effect the removal of at least a portion of the toxic and/or hazardous gas species by a chemisorbent or physisorbent reaction between the sorbent bed and the toxic gas component effectively reduces the concentration of the toxic gas component in the process diluent stream to below TLV.
申请公布号 US6843830(B2) 申请公布日期 2005.01.18
申请号 US20030249506 申请日期 2003.04.15
申请人 发明人
分类号 B01D53/04;B01D53/75;C23C16/44;(IPC1-7):B01D53/04 主分类号 B01D53/04
代理机构 代理人
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