ELECTROSTATIC CHUCK HAVING ELECTRODE WITH CURVED EDGE CAPABLE OF REDUCING LEAKAGE CURRENT, HOMOGENIZING ELECTRIC FIELD, AND SECURING SUBSTRATES

摘要

PURPOSE: An electrostatic chuck having an electrode with a curved edge is provided to reduce leakage current, homogenize electric field, and to secure a substrate using the electrostatic chuck. CONSTITUTION: An electrostatic chuck for supporting a substrate in a process chamber includes an electrode(132) and a dielectric(124) covering the electrode. The electrode includes a central planar portion having upper, lower, and peripheral portions. The electrode further at least includes one of a wire loop(156), which extends substantially continuously about a perimeter of the electrode and includes a radially outwardly facing surface that is substantially rounded, and an arch portion, which includes a tip and has a curvature of about π/8 radians between a line normal to an upper portion of the central planar portion and a line normal to an upper portion of the tip.