DEVICE AND METHOD FOR PLASMA TREATMENT

摘要

PROBLEM TO BE SOLVED: To provide a device and method for plasma treatment by which plasma of a higher density can be obtained in a state where the rise of manufacturing cost or the occurrence of damages is suppressed.

SOLUTION: The device is provided with a lower electrode 102 on which a substrate W to be treated is placed and an upper electrode 103 which is disposed to face the lower electrode 102 in a hermetically sealable treatment chamber 101. The lower and upper electrodes 102 and 103 are fixed in the chamber 101 in insulated and separated states. High-frequency power can be supplied across the electrodes 103 and 102 from a high-frequency power source 106. In addition, a field emission type electron supplying source 110 constituted of, for example, a plurality of carbon nanotubes is provided on the surface facing the lower electrode 102 of the upper electrode 103 which becomes an anode.

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