| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an original lithographic printing plate which shows successful aboard-the-machine developability; high sensitivity; high resistance to plate wear; and successful smudge-proofness during printing, when used as an aboard-the-machine development type, and can use heat efficiently for imaging; shows high sensitivity; high resistance to plate wear and less contamination of a non-image part, when used as a conventional thermal positive type or thermal negative type, and a support for a lithographic printing plate used for the original lithographic printing plate. <P>SOLUTION: The support for a lithographic printing plate is manufactured by treating a surface-roughened and anodized metallic substrate using (1) an aqueous solution containing a polyvinyl phosphonic acid and (2) an aqueous solution containing a silicic acid compound in this order or in the order of (2) and (1) or (2), (1) and (2) and adding a polymer compound containing an acid radical to the surface of the treated metallic substrate. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
