发明名称 PHOTOSENSITIVE RESIN COMPOSITION FOR PERMANENT RESIST, PHOTOSENSITIVE FILM FOR THE PERMANENT RESIST, FORMING METHOD OF RESIST PATTERN AND PRINTED WIRING BOARD
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition for a permanent resist having superior shelf stability and high temperature humidity resistance, a photosensitive film for the permanent resist, a forming method of a resist pattern, and to provide a printed wiring board. <P>SOLUTION: The photosensitive resin composition for the permanent resist contains (A) a polymer, having a carboxyl group, (B) a photopolymerizable compound having an ethylenic unsaturated bond and (C) a photopolymerization initiator and is characterized in that 0.05 to 0.3 for the total number of moles of carbon-carbon double bonds in the components (A) and (B) are contained per 100 pts.wt. total components (A) and (B). <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005099647(A) 申请公布日期 2005.04.14
申请号 JP20030356633 申请日期 2003.10.16
申请人 HITACHI CHEM CO LTD 发明人 MORITA MASAKI;HATAKEYAMA SHUICHI;NAGOSHI TOSHIMASA
分类号 G03F7/033;G03F7/004;G03F7/027;G03F7/038;H05K3/28 主分类号 G03F7/033
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