| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a quick method of controlling a defect of high sensitivity at a low cost to solve various problems of a conventional technology. <P>SOLUTION: The method of controlling the defect in a semiconductor manufacturing process provides a pattern wave having a plurality of first defects, and includes steps of performing a semiconductor manufacturing process for forming a plurality of second defects on the wafer, detecting the plurality of first defects and the plurality of second defects, distinguishing the first defects and the second defects by sorting the detected defects by a database, and classifying the second defects into a plurality of defect types. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
