发明名称 |
METHOD FOR PRODUCING SILICON OXIDE FILM, AND METHOD FOR PRODUCING OPTICAL MULTI-LAYER FILM |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for producing a silicon oxide film with which the film having uniform optical constants, such as refractive index, absorption coefficient, etc., can be formed at high deposition rate. <P>SOLUTION: The method for producing the silicon oxide film is performed, with which the silicon oxide film is formed on a substrate by using a sputtering target comprising silicon carbide and silicon with a ratio in number of atoms of C to Si being from 0.5 to 0.95 and carrying out AC sputtering having from 1 to 1000 kHz frequency in an atmosphere containing oxidizing gas. <P>COPYRIGHT: (C)2005,JPO&NCIPI |
申请公布号 |
JP2005126813(A) |
申请公布日期 |
2005.05.19 |
申请号 |
JP20040086299 |
申请日期 |
2004.03.24 |
申请人 |
ASAHI GLASS CO LTD;ASAHI GLASS CERAMICS CO LTD |
发明人 |
IKEDA TORU;MASHITA NAOHIRO;SHIDOUJI EIJI;KAMIYAMA TOSHIHISA;KATAYAMA YOSHIHITO |
分类号 |
G02B5/26;C23C14/10;C23C14/34;G02B1/11;G02B5/28 |
主分类号 |
G02B5/26 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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