发明名称 Flash memory cell having reduced leakage current
摘要 A flash memory cell of the present invention comprises a floating gate, having a charge trapping region and a fin region. A source region and a drain region is formed proximate the floating gate. A control gate is formed above the charge trapping region of the floating gate. The fin region advantageously reduces leakage current, thereby allowing further scaling of the cell.
申请公布号 US6897518(B1) 申请公布日期 2005.05.24
申请号 US20030618191 申请日期 2003.07.10
申请人 ADVANCED MICRO DEVICES, INC. 发明人 PARK SHEUNG HEE;FASTOW RICHARD M.;JU DONG-HYUK
分类号 H01L21/28;H01L29/423;(IPC1-7):H01L29/788 主分类号 H01L21/28
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