发明名称 Method for forming scribed groove and scribing apparatus
摘要 A method for forming scribed grooves on a wafer and an apparatus for implementing the method. The method moves the cutting part such that its cutting edge forms an inverted trapezoid-shaped path, thereby reducing the scribing angle of the cutting edge to an acute angle. Consequently, the stress produced by the mechanical shock at the time of the scribing can be dispersed in the moving direction of the cutting edge and in a direction perpendicular to the surface of the wafer. The horizontal movement of the scribing cutting edge in the wafer enables the application of a sufficient load in a direction perpendicular to the scribing plane in the wafer. Consequently, vertical cracks are sufficiently generated, and the amount of dimensional deviation between the scribed groove and the cleaved plane is reduced. This method can produce chips featuring outside dimensions with higher precision and cleaved surfaces with high-quality mirror finish.
申请公布号 US6916726(B2) 申请公布日期 2005.07.12
申请号 US20030624985 申请日期 2003.07.22
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 OHNO YUJI;IMAI HIROSHI;NAKASE YOSHITO
分类号 C03B33/023;C03B33/037;H01L21/301;H01L21/304;H01L21/78;(IPC1-7):H01L21/301;H01L21/46;H01L21/76 主分类号 C03B33/023
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