发明名称 Ferroelectric memory cell with angled cell transistor active region and methods for fabricating the same
摘要 Ferroelectric memory cells and fabrication methods are provided in which the memory cell comprises a ferroelectric capacitor in a capacitor layer above a semiconductor body, and a cell transistor with first and second source/drains formed in an active region of the semiconductor body. The active region extends along a first axis in the semiconductor body, and the cell includes a gate electrically coupled with a wordline structure that extends along a second axis, wherein the first axis and the second axis are oblique.
申请公布号 US6967365(B2) 申请公布日期 2005.11.22
申请号 US20030620196 申请日期 2003.07.15
申请人 TEXAS INSTRUMENTS INCORPORATED 发明人 SUMMERFELT SCOTT ROBERT;BOKU KATSUSHI
分类号 H01L21/02;H01L21/768;H01L21/8246;H01L27/115;H01L29/76;H01L29/94;H01L31/062;H01L31/113;H01L31/119;(IPC1-7):H01L29/76 主分类号 H01L21/02
代理机构 代理人
主权项
地址