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发明名称
重叠、对准标记的装置与方法以及根据光学干涉之关键尺寸度量法
摘要
以光学零差位移干涉测量学,光学相干-域反射计(OCDR),和光学干涉仪成像为基础的关于重叠,对准标记和关键尺寸(CD)度量衡的方法和装置被揭示,它可适用于微平板印刷应用以及积体电路(IC)和光罩制造,而且适用于无图案和有图案的晶圆和光罩上或其内的缺陷的检测和定位。度量衡也可被使用在高级程序控制(APC),晶圆感应位移(WIS)的确定,以及光学逼近修正(APC)的确定中。
申请公布号
TW200538704
申请公布日期
2005.12.01
申请号
TW094116651
申请日期
2005.05.23
申请人
捷特提克 协会
发明人
希尔
分类号
G01B9/02
主分类号
G01B9/02
代理机构
代理人
詹铭文;萧锡清
主权项
地址
美国
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