PLASMA TREATMENT DEVICE AND PLASMA TREATMENT METHOD

摘要

PROBLEM TO BE SOLVED: To provide plasma treatment capable of detecting abnormal discharge in real time in a chamber that is generated simultaneously with the progress of plasma treatment.

SOLUTION: This plasma treatment device comprises a chamber (1) equipped with a wafer stage (3) on which a substrate (2) to be treated is set, and works the substrate (2) by radiating plasma (4). A photon detecting sensor (5) for measuring an ultraviolet light induced current is installed at the periphery of the substrate setting surface (3a) of the wafer stage (3). Therefore, the generation of abnormal discharge is detected in real time by the output change of the photon detecting sensor (5).

COPYRIGHT: (C)2006,JPO&NCIPI