| 摘要 |
An exposure method for exposing a pattern formed on a reticle onto an object includes a flatness measurement step for measuring the flatness of the object and storing the information obtained, a position measurement step for measuring positions at plural points on the object, and a changing step for changing at least one of the position and tilt of the object on the basis of the information obtained by the flatness measurement step, and information on the position obtained by the position measurement step.
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