| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a negative photosensitive composition having satisfactory sensitivity and excellent in development stability and printing durability, and a negative photosensitive lithographic printing material excellent in safe light properties. <P>SOLUTION: The photosensitive composition contains a polymer having a polymerizable double bond in a side chain and having a carboxyl group-containing monomer as a copolymerized component, a photopolymerization initiator, a sensitizer which sensitizes the photopolymerization initiator in a wavelength region of 380-1,300 nm, a hindered phenol compound having two or more hindered phenol structures per molecule, and a hindered amine compound. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
