CHEMICAL MECHANICAL POLISHING COMPOSITION FOR METAL CIRCUIT,申请号KR20050103675-传众专利搜索

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发明名称	CHEMICAL MECHANICAL POLISHING COMPOSITION FOR METAL CIRCUIT
摘要
申请公布号	KR20070047020(A)	申请公布日期	2007.05.04
申请号	KR20050103675	申请日期	2005.11.01
申请人	SAMSUNG CORNING CO., LTD.	发明人	RHEE, JI HOON;EOM, DAE HONG;LEE, SANG ICK
分类号	C09K3/14	主分类号	C09K3/14
代理机构		代理人
主权项
地址

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