| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a mold for imprinting, having a high-accuracy fine pattern formed by using a mask blank. <P>SOLUTION: A mask blank has a thin film for forming a pattern on a light transmitting substrate, wherein the thin film comprises an upper layer made of a material containing Cr and oxygen and a lower layer made of a material that contains Ta or its compound and can be etched by a dry etching process that uses a fluorine-based gas. The upper layer of the thin film is etched by a dry etching process by using a chlorine-based gas that substantially does not contain oxygen, and subsequently the lower layer of the thin film and the substrate are etched together by a dry etching process using a fluorine-based gas to obtain a mold for imprint. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
