发明名称 |
ELECTROSTATIC DISCHARGE PROTECTION SEMICONDUCTOR DEVICE |
摘要 |
An ESD protection semiconductor device includes a substrate, a gate set formed on the substrate, a source region and a drain region formed in the substrate respectively at two sides of the gate set, and at least a first doped region formed in the drain region. The source region and the drain region include a first conductivity type, and the first doped region includes a second conductivity type. The first conductivity type and the second conductivity type are complementary to each other. The first doped region is electrically connected to a ground potential. |
申请公布号 |
US2017110446(A1) |
申请公布日期 |
2017.04.20 |
申请号 |
US201514938850 |
申请日期 |
2015.11.12 |
申请人 |
UNITED MICROELECTRONICS CORP. |
发明人 |
Huang Chung-Yu;Su Kuan-Cheng;Tang Tien-Hao;Chen Ping-Jui;Lai Po-Ya |
分类号 |
H01L27/02;H01L29/06;H01L29/78 |
主分类号 |
H01L27/02 |
代理机构 |
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代理人 |
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主权项 |
1. An electrostatic discharge (ESD) protection semiconductor device comprising:
a substrate; a gate set formed on the substrate; a source region and a drain region formed in the substrate respectively at two sides of the gate set, and the source region and the drain region comprising a first conductivity type, wherein the drain region is electrically connected to an input/out (I/O) pad; at least a first doped region formed in the drain region; the first doped region comprising a second conductivity type complementary to the first conductivity type, and the first doped region being electrically connected to a ground potential, wherein the gate set is disposed in between the source region and the first doped region; and a first blocking structure surrounding the first doped region and isolating the first doped region from the drain region. |
地址 |
Hsin-Chu City TW |