PLASMA PROCESSING EQUIPMENT AND PLASMA GENERATION EQUIPMENT

摘要

A plasma processing equipment includes a vacuum processing chamber, an insulating material, a gas inlet, a high frequency induction antenna provided at an upper outside of the vacuum processing chamber, a magnetic field coil, a yoke for controlling distribution of a magnetic field in the vacuum processing chamber, a high frequency power supply for generating plasma and supplying a high frequency current to the antenna, and a power supply for supplying power to the magnetic field coil. The antenna is divided into n high frequency induction antenna elements are arranged in tandem on one circle so that a high frequency current delayed sequentially by λ (wavelength of high frequency power supply)/n flows clockwise through the antenna elements arranged in tandem via a delay unit, and a magnetic field is applied from the magnetic field coil to generate electron cyclotron resonance (ECR) phenomenon.

主权项

1. A plasma processing method using a plasma processing apparatus comprising:
a vacuum processing chamber in which a sample disposed on a sample stage is plasma processed; a vacuum processing chamber top member provided at an upper portion of the vacuum processing chamber for sealing the vacuum processing chamber air-tightly; a high frequency induction antenna configured from a plurality of high frequency induction antenna elements and provided outside the vacuum processing chamber; a magnetic field-forming coil for forming a magnetic field within the vacuum processing chamber; and a high frequency power supply for supplying high frequency power to the high frequency induction antenna, the process comprising the step of arranging n high frequency induction antenna elements circumferentially on a surface substantially parallel to a surface of the sample stage on which the sample is disposed, where n-number is a natural number of at least 2, and λ is a wavelength of the high frequency power supplied from the high frequency power supply, flowing the high frequency power with a phase thereof sequentially delayed by λ/n into each of the n high frequency induction antenna elements that are arranged circumferentially on the surface, forming the magnetic field with the magnetic field-forming coil such that the induction electric field formed by the n high frequency induction antenna elements through which the high frequency power flow with the phase thereof sequentially delayed by λ/n rotates in a clockwise direction with respect to a direction of a line of magnetic force of the magnetic field formed within the vacuum processing chamber, and coinciding a frequency of an electron cyclotron resonance generated by a mutual interaction between the electric field and the magnetic field formed by the magnetic field-forming coil with a rotational frequency of the induction electric field.