| 摘要 |
PROVIDED IS A FERROMAGNETIC MATERIAL SPUTTERING TARGET HAVING A METAL COMPOSITION COMPRISING 5 MOL% OR MORE OF PT AND THE BALANCE OF CO, WHEREIN THE TARGET HAS A STRUCTURE INCLUDING A METAL BASE (A) AND A PHASE (B) OF A CO-PT ALLOY CONTAINING 40 TO 76 MOL% OF PT IN THE METAL BASE (A). FURTHER PROVIDED IS A FERROMAGNETIC MATERIAL SPUTTERING TARGET HAVING A METAL COMPOSITION COMPRISING 5 MOL% OR MORE OF PT, 20 MOL% OR LESS CR, AND THE BALANCE OF CO, WHEREIN THE TARGET HAS A STRUCTURE INCLUDING A METAL BASE (A) AND A PHASE (B) OF A CO- PT ALLOY CONTAINING 40 TO 76 MOL% OF PT IN THE METAL BASE (A). THE PRESENT INVENTION PROVIDES A FERROMAGNETIC MATERIAL SPUTTERING TARGET THAT CAN IMPROVE THE LEAKAGE MAGNETIC FLUX TO ALLOW STABLE DISCHARGE WITH A MAGNETRON SPUTTERING DEVICE. |
