发明名称 Measuring parallelism in lightguide surfaces
摘要 A system for measuring transparent optical elements includes a beam generator, optomechanics, an imaging module, and a logic unit. The beam generator is driven to emit a beam directed at a transparent optical element that is aligned by optomechanics. An image is captured of the beam after the beam reflects off of surfaces of the transparent optical element. The image is analyzed to measure tolerances of the transparent optical element.
申请公布号 US9494485(B2) 申请公布日期 2016.11.15
申请号 US201414200718 申请日期 2014.03.07
申请人 Google Inc. 发明人 Richards Evan M.;Gupta Anurag
分类号 G01N21/94;G01M11/00;G01B11/27 主分类号 G01N21/94
代理机构 Blakely Sokoloff Taylor & Zafman LLP 代理人 Blakely Sokoloff Taylor & Zafman LLP
主权项 1. A system for measuring parallelism in a transparent optical element, the system comprising: a wavefront generator for generating a collimated wavefront; optomechanics arranged to align the transparent optical element to receive the collimated wavefront, wherein the transparent optical element is positioned so that the collimated wavefront encounters a first surface of the transparent optical element prior to a second surface of the transparent optical element; an image forming material positioned to receive a first reflection of the collimated wavefront reflecting off the first surface of the transparent optical element, the image forming material also positioned to receive a second reflection of the collimated wavefront reflecting off the second surface of the transparent optical element, the image forming material formed from a diffuse material such that an image is formed on the image forming material due to the first and second reflections of the collimated wavefront; a camera module coupled to capture the image formed on the image forming material; and a logic unit coupled to drive the wavefront generator and coupled to receive the image from the camera module, the logic unit configured to analyze a degree of parallelism between the first surface and the second surface based on interference patterns in the image, wherein the interference patterns are formed by the first reflection and the second reflection.
地址 Mountain View CA US