| 摘要 |
1475599 Photomasks FUJI PHOTO FILM CO Ltd 23 July 1974 [23 July 1973] 32581/74 Heading G2C [Also in Division C3] A process of producing an ultraviolet shielding photomask comprises (i) irradiating actinic light through a transparent positive or negative image to imagewise expose a photographic film comprising a transparent support bearing a photosensitive layer comprising a polymer of molecular weight in the range from 1000 to 1000000 which is soluble in water, in an alcohol or in a weakly alkaline solution, which polymer is either mixed with or contains bonded to a side chain a photosensitive aromatic azide compound present in sufficient amount that on exposure to such light the polymer is cross-linked and the azide compound forms a dye with an optical density of at least 1À0 over the entire wavelength range from 340 to 450 mÁ; and (ii) washing out the unirradiated areas of the polymer by dissolving in water, a weakly alkaline aqueous solution or an alcohol to form a hardened and coloured relief image at the surface of the photo-sensitive layer. Preferred are those containing e.g. a benzylidene or cinnamylidene group. A combination of azides may be used to give uniform density over the specified wavelength range. Suitable soluble polymers are alcohol-soluble polyamide resins, polymers of 2-hydroxyethyl acrylate or methacrylate, a polymer having cis -4-cyclohexene -1, 2-carboxylate side chains, polyvinyl alcohol with grafted acrylonitrile or acrylamide, styrene-maleic anhydride copolymer, crotonic acid/vinyl acetate copolymer, acid cellulose derivatives, polyvinyl pyridine, polyvinyl pyrrolidone, novolak, novolakmodified phenol resin or a xylene resin. |
