发明名称 Bipolar transistor diffusion structure - has automatically insulated miniature components for large scale integration
摘要 <p>This bipolar transistor structure is intended for large scale integration. It consists of a semi-conductor element with a substrate containing zones of one type of conductivity bordering zones of the opposite type of conductivity and terminating in a flat surface. The zones are surrounded by coatings of insulation and the p n junctions of the bases, emitters and collectors are formed at the interfaces. The supplementary zones of the second type of conductivity are of a lower specific resistance than that of the first type. This reduces the base emitter junction resistance and the outward spread of minority carriers between the electrodes to a minimum.</p>
申请公布号 FR2243527(A1) 申请公布日期 1975.04.04
申请号 FR19730032850 申请日期 1973.09.12
申请人 TRW INC,US 发明人
分类号 H01L27/07;H01L27/082;(IPC1-7):01L29/70;01L29/06 主分类号 H01L27/07
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