| 摘要 |
<p>The method of fabricating a plasma charge transfer device comprising forming electrodes on a pair of substrates and coating certain electrodes with a coating of dielectric material which forms the wall on which a charge is formed during the operation of the device, forming cavity material on the pairs of substrates to hold an ionizable medium to be activated by an electric pulse applied to the electrodes, and positioning and sealing the two pairs of substrates to enclose the cavity, and filling the cavity with the ionizable medium to form a complete plasma charge transfer device.</p> |
