发明名称 HALBLEITERBAUELEMENT MIT HETEROUEBERGANG
摘要 A semiconductor device comprising a silicon substrate with an oxygen doped polycrystalline or amorphous silicon layer formed on the substrate so as to form a hetero junction therewith. A transistor formed according to the invention has an emitter-base hetero junction and has a high current gain.
申请公布号 DE2618733(A1) 申请公布日期 1976.11.11
申请号 DE19762618733 申请日期 1976.04.28
申请人 SONY CORP. 发明人 MATSUSHITA,TAKESHI;HAYASHI,HISAO;SHIBAZAKI,MITSURU
分类号 H01L21/00;H01L21/205;H01L21/314;H01L21/316;H01L21/331;H01L21/337;H01L23/29;H01L23/31;H01L27/06;H01L29/04;H01L29/10;H01L29/16;H01L29/165;H01L29/43;H01L29/45;H01L29/73;H01L29/737;H01L29/80;H01L29/808;(IPC1-7):H01L29/72 主分类号 H01L21/00
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