发明名称 Component for a Radiation Source, Associated Radiation Source and Lithographic Apparatus
摘要 Disclosed is component for a radiation source, said radiation source being operable to generate radiation from a fuel, said component having a surface comprising a plurality of first regions that have a high wettability by said fuel, separated by second regions which have a low wettability by said fuel. Said component may comprise a screening element for a droplet generator or contamination trap, for example.
申请公布号 US2016377985(A1) 申请公布日期 2016.12.29
申请号 US201414901941 申请日期 2014.06.17
申请人 ASML NETHERLANDS B.V. 发明人 NIENHUYS Han-Kwang
分类号 G03F7/20 主分类号 G03F7/20
代理机构 代理人
主权项 1. A component for a radiation source, said radiation source being operable to generate radiation from a fuel, such as liquid tin, the component comprising: at least one surface comprising a plurality of first regions that have a high wettability for the fuel, wherein the plurality of first regions are separated by second regions that have a low wettability for the fuel.
地址 Veldhoven NL