发明名称 |
Method for depositing silicon nanocrystals in hollow fibers |
摘要 |
A method for depositing a layer of silicon nanocrystals upon the inside surface of hollow fibers is disclosed. In particular, the method includes inserting a hollow glass fiber into a solution of hydrogen silsesquioxane, removing the solvent and heating the hollow glass fiber to a temperature suitable to form silicon nanocrystals, and subsequently cooling the hollow glass fiber. |
申请公布号 |
US9452446(B2) |
申请公布日期 |
2016.09.27 |
申请号 |
US200912934125 |
申请日期 |
2009.03.31 |
申请人 |
The Governors of the University of Alberta |
发明人 |
Veinot Jonathan;Rodriguez Jose Roberto;Bianucci Pablo;Meldrum Al |
分类号 |
C30B7/14;C30B29/06;C30B29/66;C30B30/00;C30B7/06;B05D7/22;B82Y15/00;B82Y20/00;B82Y30/00;C01B33/021;C01B33/023;C30B28/04;C30B29/60 |
主分类号 |
C30B7/14 |
代理机构 |
Bereskin & Parr LLP/S.E.N.C.R.L., s.r.l. |
代理人 |
Bereskin & Parr LLP/S.E.N.C.R.L., s.r.l. ;Fenwick Michael |
主权项 |
1. A method for depositing a layer of silicon nanocrystals on an inner surface of a hollow fiber and obtaining whispering gallery mode resonator, the method comprising:
a) inserting a tip of the hollow fiber into a solution of hydrogen silsesquloxane (HSQ) in a suitable solvent at an angle of about 70° to about 90° between the fiber and the solution, wherein an inner surface of the fiber is coated with the HSQ solution by capillary action; b) heating the coated hollow fiber in a reducing atmosphere under conditions to remove the solvent; c) heating the hollow fiber in a reducing atmosphere to a temperature suitable to form silicon nanocrystals; and d) cooling the hollow fiber to obtain the whispering gallery mode resonator. |
地址 |
Edmonton, Alberta CA |