发明名称 Episcopic projection system for making dress patterns - uses hip and bust measurements separately for accurate sizing
摘要 <p>The patterns can be drawn to any size by episcopic projection. In the first step the part of the reduced pattern above the waist is brought to the original size with the bust measurement as the reference size whilst in a subsequent step the part of the reduced pattern beneath the waist is brought to the original size with the hip measurement as the reference. In this way by using the two measurements independently an accurately sized pattern can be produced even where the two measurements are not in the standard proportion. A tape measure on which the measurements for the hips and bust are placed separately side by side can be used to measure the distance between the projection appts. and the drawing support.</p>
申请公布号 DE2041538(B2) 申请公布日期 1980.05.14
申请号 DE19702041538 申请日期 1970.08.21
申请人 SCHMIDT, OSKAR, 4902 BAD SALZUFLEN 发明人 SCHMIDT, OSKAR, 4902 BAD SALZUFLEN
分类号 A41H3/00;(IPC1-7):41H3/00 主分类号 A41H3/00
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