发明名称 |
POLYMER POSITIVE IMAGE FORMING METHOD |
摘要 |
PURPOSE:To form a polymer positive image with high sensitivity and high resolving power by utilizing the decomposability of a high molecular compound having sulfide bonds and using the compound as a photoresist. CONSTITUTION:A high molecular compound having one or more sulfide bonds in each molecule and a mol. wt. of about 1,000 or more is used. The compound includes a ring opened polymer of a cyclic sulfide compound such as ethylene sulfide or cyclohexene sulfide and a high mol. wt. condensate of alkyl dihalide and sodium sulfide. A soln. of the high molecular compound in an org. solvent is coated onto a substrate such as a glass plate or a silicon plate and dried to form a polymer film. The film is then imagewise exposed by irradiating light or radiation, and the irradiated portion of the film is dissolution-removed by solvent treatment to obtain the desired positive image. |
申请公布号 |
JPS55164825(A) |
申请公布日期 |
1980.12.22 |
申请号 |
JP19790072107 |
申请日期 |
1979.06.08 |
申请人 |
KOGYO GIJUTSUIN |
发明人 |
TANAKA HIDEAKI;KOBAYASHI RIKIO;KOMIZU HIDEO |
分类号 |
G03F7/004;C08G75/00;C08G75/02;C08G75/06;C08G75/14;G03C1/72;G03F7/039;H01L21/027;H01L21/302 |
主分类号 |
G03F7/004 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|