| 摘要 |
A method of vapor depositing a material onto a substrate results in improved substrate step coverage by the material while keeping the substrate clean by minimizing the evaporation of contaminants onto the surface of the substrate. The method comprises depositing a first layer of material onto the substrate, while the substrate is at a first temperature, heating the substrate to a higher temperature, and then depositing a second layer while maintaining the substrate at the higher temperature. |
